Resist
In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.
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Famous quotes containing the word resist:
“Nobody can resist a ripe idea. The idea today is change.”
—Tansu Ciller (b. 1946)
“The general review of the past tends to satisfy me with my political life. No man, I suppose, ever came up to his ideal. The first half [of] my political life was first to resist the increase of slavery and secondly to destroy it.... The second half of my political life has been to rebuild, and to get rid of the despotic and corrupting tendencies and the animosities of the war, and other legacies of slavery.”
—Rutherford Birchard Hayes (1822–1893)
“We should have an army so organized and so officered as to be capable in time of emergency, in cooperation with the National Militia, and under the provision of a proper national volunteer law, rapidly to expand into a force sufficient to resist all probable invasion from abroad and to furnish a respectable expeditionary force if necessary in the maintenance of our traditional American policy which bears the name of President Monroe.”
—William Howard Taft (1857–1930)