Resist
In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.
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Famous quotes containing the word resist:
“I love to weigh, to settle, to gravitate toward that which most strongly and rightfully attracts me;Mnot hang by the beam of the scale and try to weigh less,—not suppose a case, but take the case that is; to travel the only path I can, and that on which no power can resist me. It affords me no satisfaction to commence to spring an arch before I have got a solid foundation.”
—Henry David Thoreau (1817–1862)
“The general review of the past tends to satisfy me with my political life. No man, I suppose, ever came up to his ideal. The first half [of] my political life was first to resist the increase of slavery and secondly to destroy it.... The second half of my political life has been to rebuild, and to get rid of the despotic and corrupting tendencies and the animosities of the war, and other legacies of slavery.”
—Rutherford Birchard Hayes (1822–1893)
“‘Tis said of love that it sometimes goes, sometimes flies; runs with one, walks gravely with another; turns a third into ice, and sets a fourth in a flame: it wounds one, another it kills: like lightning it begins and ends in the same moment: it makes that fort yield at night which it besieged but in the morning; for there is no force able to resist it.”
—Miguel De Cervantes (1547–1616)