Resist
In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.
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Famous quotes containing the word resist:
“The besetting sin of able men is impatience of contradiction and of criticism. Even those who do their best to resist the temptation, yield to it almost unconsciously and become the tools of toadies and flatterers. “Authorities,” “disciples,” and “schools” are the curse of science and do more to interfere with the work of the scientific spirit than all its enemies.”
—Thomas Henry Huxley (1825–95)
“If we resist our passions, it is more because of their weakness than because of our strength.”
—François, Duc De La Rochefoucauld (1613–1680)
“I resist change even as I call for it.”
—Mason Cooley (b. 1927)