Introduction
OASIS is the successor to the integrated circuit design and manufacturing electronic pattern layout language, GDSII.
GDSII had been created in the 1970s when integrated circuit designs had a few hundred thousand geometric shapes, properties and placements to manage. Today, there can be billions of shapes, properties and placements to manage. OASIS addressed the constraints that were preventing its effective use during the design and manufacture of today's leading edge integrated circuits.
The effort to create the competing format OASIS started in June 2001. The release of version 1.0 took place in March 2004. Its use required the development of new OASIS readers and writers that could be coupled to design and manufacturing equipment already equipped with GDSII readers and writers. Its industry wide adoption was born out of a concerted effort by integrated circuit design, equipment, photomask, fabless, 3rd party Intellectual Property (IP) and manufacturing companies from the United States, Japan, Taiwan, Korea and Europe. OASIS is now used for most leading edge integrated circuit designs.
A constrained version of OASIS, called OASIS.MASK, addresses the unique needs of semiconductor photomask manufacturing equipment such as pattern generators and inspection systems. Both OASIS and OASIS.MASK are industry standards.
Read more about this topic: Open Artwork System Interchange Standard
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