Electron Beam Lithography
Electron lithograph is a device in which a very fine electron beam is used to create micro-structures in the resist that can subsequently be transferred to the substrate material, often by etching. It was developed for manufacturing integrated circuits, and is also used for creating nanotechnology architectures. Electron beams with diameter ranging from 2 up to hundreds nano meters, are used in electron lithographs.
The form of maskless lithography has found wide usage in photomask-making used in photolithography, low-volume production of semiconductor components, and research & development. The electron lithograph is also used to produce computer-generated holograms (CGH).
Read more about this topic: Electron Beam Technology
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