Dichlorosilane

Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H₂SiCl₂. In its major use, it is mixed with ammonia (NH₃) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS:NH₃ (i.e. 16:1), usually results in lower stress nitride films.