Chemical States From XPS Analyses
The ability to produce Chemical State information from the topmost 1-12 nm of any surface makes XPS a unique and invaluable tool for understanding the chemistry of any surface either, as received, or after physical or chemical treatment(s). Because modern systems use monochromatic X-ray sources, XPS measurements leave the surface free of any degradation with few exceptions.
Chemical state analysis of the surface of polymers readily reveals the presence or absence of the chemical states of carbon known as: carbide (C 2-), hydrocarbon (C-C), alcohol (C-OH), ketone (C=O), organic ester (COOR), carbonate (CO3), fluoro-hydrocarbon (CF2-CH2), trifluorocarbon (CF3).
Chemical state analysis of the surface of a silicon wafer readily reveals the presence or absence of the chemical states of silicon known as: n-doped silicon, p-doped silicon, silicon suboxide (Si2O), silicon monoxide (SiO), Si2O3, silicon dioxide (SiO2).
Read more about this topic: X-ray Photoelectron Spectroscopy
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