Example: Elpida 90 Nm DDR2 SDRAM Process
- Use of 300 mm wafer size
- Use of KrF (248 nm) lithography with optical proximity correction
- 512 Mbit
- 1.8 V operation
- Derivative of earlier 110 nm and 100 nm processes
Read more about this topic: 90 Nanometer
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“At the heart of the educational process lies the child. No advances in policy, no acquisition of new equipment have their desired effect unless they are in harmony with the child, unless they are fundamentally acceptable to him.”
—Central Advisory Council for Education. Children and Their Primary Schools (Plowden Report)